An international team of scientists has developed a new technique for
fabricating nanowire photonic and electronic integrated circuits that could be
suitable for high-volume commercial production.
Boffins from Harvard University, in collaboration with the German
universities of Jena, Gottingen and Bremen, explained that semiconductor
nanowires can be easily synthesised in large quantities using inexpensive
chemical methods.
However, it has not previously been possible to reliably mass produce
functional circuits from these nanowires.
Harvard School of Engineering and Applied Sciences researchers Mariano
Zimmler, Federico Capasso, Robert L. Wallace and Vinton Hayes worked with
Professor Carsten Ronning of the University of Jena on the technique.
By incorporating 'spin-on glass' technology used in silicon integrated
circuits manufacturing, and photolithography to transfer a circuit pattern onto
a substrate with light, the team demonstrated a reproducible, high-volume and
low-cost fabrication method for integrating nanowire devices directly onto
silicon.
"Because our fabrication technique is independent of the geometrical
arrangement of the nanowires on the substrate, we envision further combining the
process with one of the several methods already developed for the controlled
placement and alignment of nanowires over large areas," said Capasso.
"We believe the marriage of these processes will soon provide the necessary
control to enable integrated nanowire photonic circuits in a standard
manufacturing setting."
The researchers have filed for US patents covering the invention.
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