Toshiba
has announced the development of a 16Gb Nand Flash memory chip fabricated with
43nm process technology co-developed with
SanDisk.
The products have a chip area of 120 square millimetres, less than 30 per
cent that of same density Nand Flash memories jointly developed by Toshiba and
SanDisk and fabricated with 56nm process technology.
Toshiba explained that memory cells are grouped and controlled in Nand
strings of 64 cells aligned in parallel, double the number of 56nm devices, with
a dummy word-line at either end to prevent program disturbance.
This technology contributes to a reduction in the number of select gates and
improves memory area efficiency, the company said.
Toshiba will start shipments of commercial samples of new 16Gb single-chip,
multi-level cell Nand Flash memories from today, and start mass production from
March.
Mass production of 32Gb Nand Flash memories is scheduled for early in the
third quarter of this year.
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